RFマグネトロンスパッタ法によるB-C-N薄膜の合成(機械要素,潤滑,工作,生産管理など)

概要

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B-C-N films were prepared on single crystal silicon substrates by RF magnetron sputtering using a composite target of diamond and cBN powder. The target was mounted on a RF magnetron cathode, then sputtered by nitrogen and hydrogen gases. The hardness of the B-C-N film increased with increasing hydrogen flow rate, corresponding to a maximum at 10 cm^3/min, followed by a drop above 30 cm^3/min. The film was stable for a long time when it was deposited at the substrate temperature of 500℃. Auger electron spectroscopy and elastic recoil detection analysis revealed that the carbon content in the B-C-N film decreased with increasing the substrate temperature. Furthermore the B-C-N film didn't show the significant weight change under the heat treatment test at 500℃ in the air, and the hardness of the B-C-N film remained constant up to 500℃, whereas the DLC films were disappeared after the test at 500℃. These results suggest that the B-C-N film has the potential to be applied to the tribological coatings under relatively high temperature conditions.
一般社団法人日本機械学会の論文
2002-05-25