108 rfマグネトロンスパッタ法によるB-C-N系薄膜の合成(OS 材料の超精密加工とマイクロ加工)

概要

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B-C-N films were prepared on single silicon substrates by rf magnetron sputtering using a composite target of diamond and cBN powder. The target was mounted on a rf magnetron cathode,then sputtered by nitrogen and hydrogen gases.The hardness of the B-C-N film increases with increasing hydrogen flow rate,corresponding to a maximum at 10 cm^3/min,followed by a drop above 30cm^3/min. The film was stable for a long time when it was deposited at the substrate temperature of 500℃ .Furthermore that the B-C-N film didn't show the significant weight change under the.heat treatment test at 500℃ in the air,whereas the DLC films were disappeared after the test.These results suggest that the B-C-N film has the potential to be applied to the tribological coatings under relatively high temperature conditions.
一般社団法人日本機械学会の論文
2000-11-24