1132 溶射プラズマ CVD 法による Ti-DLC 膜の合成とその機械的特性

概要

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Diamond-Like Carbon films are increasing their application fields due to the outstanding wear-resistant properties. This study presents fabrication of nano-structured Ti-DLC films using arc-glow hybrid plasma. A deposition apparatus consists of a DC plasma torch, a substrate holder and a vacuum chamber. An orifice of 10mm diameter mounted at the exit of the torch can generate appropriate pressure difference between the torch and the chamber. Ti particles are sprayed onto the substrate with plasma jet. RF power supply is connected to the substrate holder to generate a glow discharge plasma, and DLC films are prepared by RF plasma CVD at the same time. The hardness of the deposited film increased from 13 to 30GPa with decreasing the Ti content in the film from 0 to 30 vol.%. The thickness of the films was approximately 6 μm in 30 min deposition These results lead to the conclusion that thick Ti-DLC film can be fabricated at high growth rate by the arc-glow hybrid plasma CVD.
一般社団法人日本機械学会の論文
2003-08-05