S0401-3-1 ダイヤモンド膜合成の低温化に及ぼすナノパルス援用効果([S0401-3]表面改質および薄膜コーティング(3))

概要

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Diamond has many outstanding characteristics such as extremely high hardness, high thermal conductivity and high wear resistance. Hence diamond films are expected to be applied to cutting tools and sliding surface, etc. However, It is a problem that CVD diamond growth requires high substrate temperature as high as 800℃ In this study, nanopulse plasma is applied to conventional hot filament CVD diamond growth to overcome those problems. Nanopluse plasma is extremely so short pulse that it has possibilities to generate high density plasma instantaneously and to prevent substrate from being heated. As a result, it was found that nanopulse enhancement resulted in growing diamond film at low substrate temperature.
一般社団法人日本機械学会の論文
2010-09-04