ナノパルスプラズマCVD法による準大気圧下でのダイヤモンド状炭素膜の合成

概要

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Diamond-like Carbon (DLC) films are usually deposited under low pressure, typically below 10 Pa. Atmospheric pressure deposition of DLC films is promising technique to realize in-process and in-use coating of DLC films. Here we report the development of the nanopulse plasma chemical vapor deposition method using static induction (SI) thyristor and application of the synthesis method to deposit DLC films, and show that DLC films with excellent mechanical performance can be prepared at subatmospheric pressure at 26.7 kPa (200 Torr). The characteristics of the thus-obtained DLC films show two broad peaks of the disordered band at 1360cm^<-1> and the graphitic band at 1580cm^<-1> by Raman spectroscopy and the thickness is 1.6μm with the surface roughness of 0.07 nmRa. The hardness of the DLC film as measured with nanoindentor is 20.8 GPa and elastic modulus is 170 GPa.
社団法人精密工学会の論文
2005-12-05