ダイヤモンド高速合成用アーク放電プラズマ装置の試作

概要

論文の詳細を見る
This paper describes the development of arc discharge plasma jet chemical vapor deposition (CVD) apparatus for the high rate synthesis of diamond. Methane and hydrogen are used as source gases. In terms of generating a stabilized plasma jet, gas flow routes of the source gases are discussed. When both methane and hydrogen are supplied from cathode nozzle, the electric discharge power varies a lot from set value, and the plasma jet becomes unstable. When methane is used as an atmospheric gas and is poured into the reaction chamber, however, the stabilized plasma jet is obtained. The methane is mixed into the plasma jet, the plasma jet is sprayed onto a cool-down substrate, and a diamond film is deposited on the substrate surface. By means of this methane atmosphere technique, a diamond film is deposited on a molybdenum substrate at the growth rate of 930 μm/h. The crystallinity of the diamond film measures well by means of X-ray diffraction and Raman spectroscopy.
公益社団法人精密工学会の論文
1989-12-05