熱化学反応によるダイヤモンド膜の研磨 : 最適研磨条件の選定

概要

論文の詳細を見る
The optimum condition of diamond film polishing using hot metallic plates is determined experimentally. Although diamond films deposited by microwave plasma CVD are not firmly connected to the surface of substrates, under low applied pressures and slow spinning speeds, diamond film can be polished smooth without peeling off the substrate by using hot metals. In this study, the effects of polishing conditions on polishing rate are examined by changing the polishing plate materials, temperatures, atmospheric gases, applied pressures and spinning speeds. As an optimum polishing condition, a 7×7 mm diamond film with a surface of 2.5 μm Rmax is polished at 950℃ in vacuum for 15 minutes, then polished at 750℃ in a hydrogen atmosphere for 20 minutes, using an iron polishing plate under an applied pressure 40 kPa and a spinning speed 7 mm/s. A smoothly polished surface of 2.5 nm Ra is obtained. The polishing rates at 950℃ in vacuum and at 750℃ in hydrogen are about 7 μm/h and 0.5μm/h respectively.
公益社団法人精密工学会の論文
1991-01-05