電子ビーム励起プラズマ援用イオンビームスパッタリング法によるダイヤモンドライクカーボン膜の気相合成

概要

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A new type of deposition process, ion beam sputtering enhanced by electron beam excited plasma, was proposed in order to deposit hydrogen-free and sp^3 bonding rich diamond-like carbon (DLC) films. In the process, single carbon ions and atoms are generated by ion beam sputtering, and the single atoms are ionized by collision with an electron beam. The results of enhancement by electron beam excited plasma are as follows. Firstly, growth rates of DLC film increase. Secondly, continuous and smooth DLC films are deposited without droplets. Thirdly, Raman spectroscopy of DLC films infers the change of film structure to higher sp^3 bonding content. Fourthly, DLC films are infrared transparent at the wavelength of 2.5-25 μm, and finally, the friction coefficient between a steel ball and a doped silicon wafer decreases by coating DLC film.
公益社団法人精密工学会の論文
2000-10-05