Tribological Properties of Amorphous Boron Nitride Films Prepared by Nanopulse Plasma CVD
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概要
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Hydrogenerated boron nitride (BN:H) films were deposited by nanopulse plasma chemical vapor deposition (CVD) using borane-ammonia complex as a source gas. Fourier transform infrared (FTIR) spectroscopy, glancing angle x-ray diffraction (XRD) and atomic force microscopy indicated that the BN films had a smooth surface and amorphous structure. Surface roughness (Ra) value of these films was under 0.5 nm. The films deposited at room temperature had high adhesion strength, as determined by scratch tests. Ball-on-disk tests were carried out to evaluate the tribological properties of the deposited films against the SUJ2 ball. The friction coefficients of BN:H films deposited at 300°C and 400°C were very high, exceeding 1.0. The specific wear rate of these BN:H films was as low and of the order of 10-7 mm3/Nm which is close to that of DLC. Annealing tests on the deposited BN:H films were performed in order to evaluate their thermal stability. It was found that the deposited BN:H films had higher thermal stability than DLC films at 500°C in air.
著者
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Ohtake Naoto
Nagoya Univ. Nagoya Jpn
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Murakami Hiroya
Tokyo Inst. Of Technol. Tokyo Jpn
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YASUHARA Toshiyuki
Tokyo Institute of Technology
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YASUHARA Toshiyuki
Tokyo Institute of Technology, Dept. of Mechanical Sci. and Eng.
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SAITO Masanori
Tokyo Institute of Technology, Dept. of Mechanical Sci. and Eng.
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