K-1029 RFマグネトロンスパッタ法によるB-C-N系薄膜の合成(S14-2 表面改質材の特性(2))(S14 表面改質材の特性)

概要

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BCN films were prepared on single crystal silicon substrates by RF magnetron sputtering using a composite target of diamond and cBN powder. The target was mounted on a RF magnetron cathode, then sputtered by nitrogen and hydrogen gases. The hardness of the BCN film increased with increasing hydrogen flow rate, corresponding to a maximum at 10 cm^3/min, followed by a drop above 30 cm^3/min. The film was stable for a long time when it was deposited at the substrate temperature of 500℃. Furthermore the BCN film didn't show the significant weight change under the heat treatment test at 500℃ in the air, and the hardness of the BCN film remained constant up to 500℃, whereas the DLC films were disappeared after the test. These results suggest that the BCN film has the potential to be applied to the tribological coatings under relatively high temperature conditions.
2001-08-22