Dry Etching of Cr_2O_3/Cr Stacked Film during Resist Ashing by Oxygen Plasma
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-01-15
著者
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IWAI Hiroshi
Frontier Research Center, Tokyo Institute of Technology
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Ohmi Shun-ichiro
Department Of Applied Electronics Interdisciplinary Graduate School Of Science And Engineering Tokyo
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Ohmi Shun-ichiro
Department Of Information Processing Interdisciplinary Graduate School Of Science And Engineering To
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TONOTANI Junichi
Corporate Manufacturing Engineering Center, Toshiba Corporation
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Tonotani J
Corporate Manufacturing Engineering Center Toshiba Corporation
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Tonotani Junichi
Corporate Manufacturing Engineering Center Toshiba Corporation
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Iwai Hiroshi
Frontier Collaborative Research Center Tokyo Institute Of Technology
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