Dry Etching of Cr_2O_3/Cr Stacked Film during Resist Ashing by Oxygen Plasma

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2005-01-15

著者

• IWAI Hiroshi

  Frontier Research Center, Tokyo Institute of Technology

• Ohmi Shun-ichiro

  Department Of Applied Electronics Interdisciplinary Graduate School Of Science And Engineering Tokyo

• Ohmi Shun-ichiro

  Department Of Information Processing Interdisciplinary Graduate School Of Science And Engineering To

• TONOTANI Junichi

  Corporate Manufacturing Engineering Center, Toshiba Corporation

• Tonotani J

  Corporate Manufacturing Engineering Center Toshiba Corporation

• Tonotani Junichi

  Corporate Manufacturing Engineering Center Toshiba Corporation

• Iwai Hiroshi

  Frontier Collaborative Research Center Tokyo Institute Of Technology

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