Formation of Ammonium Salts and Their Effects on Controlling Pattern Geometry in the Reactive Ion Etching Process for Fabricating Aluminum Wiring and Polysilicon Gate
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2002-04-15
著者
-
YAMAGE Masashi
Corporate Manufacturing Engineering Center, Toshiba Corporation
-
Saito Shin-ich
Central Research Laboratory Hitachi Ltd.
-
Saito S
Central Research Laboratory Hitachi Ltd.
-
Sugita K
Graduate School Of Science And Technology Chiba University
-
Yamage Masashi
Corporate Manufacturing Engineering Center Toshiba Corporation
-
SAITO Shuichi
Graduate School of Science and Technology, Chiba University
-
SUGITA Kazuyuki
Graduate School of Science and Technology, Chiba University
-
TONOTANI Junichi
Corporate Manufacturing Engineering Center, Toshiba Corporation
-
Tonotani J
Corporate Manufacturing Engineering Center Toshiba Corporation
-
Tonotani Junichi
Corporate Manufacturing Engineering Center Toshiba Corporation
-
Sugita K
Faculty Of Pharmaceutical Sciences University Of Tokyo
関連論文
- Investigation of the Transient Glow Discharge in Nitrogen
- Effect of CHF_3 Addition on Reactive Ion Etching of Aluminum Using Inductively Coupled Plasma
- New Inductively Coupled Plasma System Using Divided Antenna for Photoresist Ashing
- Electro-Luminescence from Ultra-Thin Silicon
- Synthesis, Monolayer Formation, and Control of Electrical Characteristics of 3-nm-Diameter Gold Nanoparticles
- Photodegradable Toners for Electrophotography III. Accelerated Photodegradation and Suppressed Photocrosslinking of Matrix Resin-Their Dependence on Polymer Composition, UV-light Source, and Irradiation Conditions
- Conductance Switching Phenomena and H-Like Aggregates in Squarylium-Dye Langmuir-Blodgett Films : Surfaces, Interfaces, and Films
- A Surface-Silylated Single-Layer Resist Using Chemical Amplification for Deep Ultraviolet Lithography:II. Limited Permeation of Si Compounds from Liquid Phase^* : Instrumentation, Measurement, and Fabrication Technology
- Photodegradable Toners for Electrophotography II. Accelerated Photodegradation of Matrix Resin by Deep Ultraviolet-Exposure at an Elevated Temperature
- A Surface-Silylated Single-Layer Resist Using Chemical Amplification for Deep-Ultraviolet Lithography : I.Limited Permeation of Si Compounds from Vapor Phase
- Enhancement of Dry-Etching Durabilities by Energy or Etchant Quenching with Aliphatic, Aromatic and Alicyclic Homopolymers, Polymer Blends and Copolymers
- Energy Quenching Effects on Dry-Etching Durability of Copolymers and Polymer Blends of Vinylnaphthalene or a-Methyl Styrene with Methyl Methacrylate
- Large Electric Conductance in the Interface Direction of Polar/Nonpolar Double-Layered Hetero-Langmuir-Blodgett Films
- Photodegradable Toners for Electrophotography I. Photodegradability of Matrix Resin
- Inversion Electron Mobility Affected by Phase Separation in High-Permittivity Gate Dielectrics
- Formation of Ammonium Salts and Their Effects on Controlling Pattern Geometry in the Reactive Ion Etching Process for Fabricating Aluminum Wiring and Polysilicon Gate
- Growth and Stability of H_2-Phthalocyanine Thin Films on MoS_2 Surfaces Studied by Means of Low-Energy Electron Transmission Spectroscopy
- Growth of Pb-Phthalocyanine Thin Films on MoS_2 Surfaces Studied by Means of Low-Energy Electron Transmission Spectroscopy
- Effective Electron Mobility Reduced by Remote Charge Scattering in High-K Gate Stacks : Short Note
- A Surface-Silylated Single-Layer Resist Using Chemical Amplification for Deep-UV and Vacuum-UV Lithography
- NOVEL PHORBOL ANALOGS WHICH BIND TO PROTEIN KINASE C (PKC) WITHOUT ACTIVATION
- Dry Etching of Cr_2O_3/Cr Stacked Film during Resist Ashing by Oxygen Plasma
- Dry-Etching Durability of Copolymers and Polymer Blends of Vinylnaphthalene or α-Methylstyrene with Methyl Methacrylate
- Measurement of Electron Density of Reactive Plasma Using a Plasma Oscillation Method(Nuclear Science, Plasmas, and Electric Discharges)
- End-point Detection of Reactive Ion Etching by Plasma Impedance Monitoring
- New Inductively Coupled Plasma System Using Divided Antenna for Photoresist Ashing
- End-point Detection of Reactive Ion Etching by Plasma Impedance Monitoring