Effect of CHF_3 Addition on Reactive Ion Etching of Aluminum Using Inductively Coupled Plasma
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概要
- 論文の詳細を見る
- 2005-05-15
著者
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Saito Shin-ich
Central Research Laboratory Hitachi Ltd.
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Saito S
Central Research Laboratory Hitachi Ltd.
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Sugita K
Graduate School Of Science And Technology Chiba University
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SAITO Shuichi
Graduate School of Science and Technology, Chiba University
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SUGITA Kazuyuki
Graduate School of Science and Technology, Chiba University
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TONOTANI Junichi
Corporate Manufacturing Engineering Center, Toshiba Corporation
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Tonotani J
Corporate Manufacturing Engineering Center Toshiba Corporation
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Tonotani Junichi
Corporate Manufacturing Engineering Center Toshiba Corporation
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Sugita K
Faculty Of Pharmaceutical Sciences University Of Tokyo
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