Characterization of Damage of AlO/Ge Gate Stack Structure Induced with Light Radiation during Plasma Nitridation (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)
スポンサーリンク
概要
著者
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Sakashita Mitsuo
Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University
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Zaima Shigeaki
Department Of Crystalline Materials Science Graduate School Of Engineering Nagoya University
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Kato Kimihiko
Department Of Cardiovascular Medicine Gifu Prefectural Government Tajimi Hospital
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Kato Kimihiko
Graduate School Of Eng. Nagoya Univ.:research Fellow Of Japan Society For The Promotion Science
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Takeuchi Wakana
Graduate School Of Eng. Nagoya Univ.
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Nakatsuka Osamu
Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan
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Takeuchi Wakana
Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan
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Shibayama Shigehisa
Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan
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