Temperature Dependence of Release Effect for Antisticking Layer in Nanoimprint Characterized by Scanning Probe Microscopy
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概要
- 論文の詳細を見る
In nanoimprint lithography (NIL), molds are in direct contact with replication materials. Furthermore, the glass transition temperature is around 100–200 °C in thermal NIL. We examined the temperature dependence of a release effect for the antisticking layer of a self-assembled monolayer with a fluoropolymer by scanning probe microscopy (SPM). We measured the contact angle and frictional force of the antisticking layer with and without annealing. The contact angle decreases and the frictional force increases at annealing temperatures greater than 500 °C. We analyzed the chemical composition of the antisticking layer with and without annealing by X-ray photoelectron spectroscopy (XPS). From the obtained measurement results, the CF3 and CF2 peaks of the antisticking layer disappeared after annealing at temperatures greater than 500 °C. These results show that the antisticking layer annealed at temperatures less than 500 °C has a sufficient release effect.
- 2008-09-25
著者
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Kanda Kazuhiro
Graduate School Of Science And Laboratory Of Advanced Science And Technology For Industry Himeji Ins
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Haruyama Yuichi
Graduate School Of Science And Laboratory Of Advanced Science And Technology For Industry Himeji Ins
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Okada Makoto
Graduate School Of Science Laboratory Of Advanced Science And Technology For Industry (lasti) Univer
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IWASA Masayuki
SII Nanotechnology Inc.
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Matsui Shinji
Graduate School Of Science And Laboratory Of Advanced Science And Technology For Industry Himeji Ins
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Yamada Noriko
Graduate School of Science, LASTI, University of Hyogo, 3-1-2 Koto, Kamigori, Ako, Hyogo 678-1205, Japan
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Haruyama Yuichi
Graduate School of Science, LASTI, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Nakamatsu Ken-ichiro
Graduate School of Science, Laboratory of Advanced Science and Technology for Industry (LASTI), University of Hyogo
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Nakamatsu Ken-ichiro
Graduate School of Science, LASTI, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Yamada Noriko
Graduate School of Science, LASTI, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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Iwasa Masayuki
SII Nanotechnology Inc., RBM Tsukiji Building, 2-15-5 Shintomi, Chuo-ku, Tokyo 104-0041, Japan
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Kanda Kazuhiro
Graduate School of Science, LASTI, University of Hyogo, 3-1-2 Koto, Kamigori, Hyogo 678-1205, Japan
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