A Structured Routing Architecture for Practical Application of Character Projection Method in Electron-Beam Direct Writing
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概要
- 論文の詳細を見る
To improve throughput of Electron Beam Direct Writing (EBDW) with Character Projection (CP) method, a structured routing architecture (SRA) has been proposed to restrict VIA placement and wire-track transition. It reduces possible layout patterns in the interconnect layers, and increases VIA and metal figure numbers in the EB shots while suppressing the CP character number explosion. In this paper, we discuss details of the SRA design methodology, and demonstrate the CP performance by SRA in comparison with other EBDW techniques. Our experimental results show viable CP performance for practical use, and prove SRAs feasibility in 14nm mass fabrication.
- The Institute of Electronics, Information and Communication Engineersの論文
著者
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Ikeda Makoto
Department Of Agricultural Chemistry Tohoku University:(present)section Of Phytochemical Research Ei
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Komatsu Satoshi
Vlsi Design And Education Center (vdec) The University Of Tokyo
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Asada Kunihiro
Vlsi Design And Education Center (vdec) The University Of Tokyo
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IIZUKA Tetsuya
Department of Electrical Engineering and Information Systems, Graduate School of Engineering, The University of Tokyo
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IKENO Rimon
VLSI Design and Education Center (VDEC), The University of Tokyo
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MARUYAMA Takashi
e-Shuttle, Inc.
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