Characterization of Fogging and Develop-Loading Effects in Electron-Beam Direct-Writing Technology (Special Issue : Microprocesses and Nanotechnology)

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文

著者

• MARUYAMA Takashi

  e-Shuttle, Inc.

• Kon Jun-ichi

  Fujitsu Laboratories Ltd., Atsugi, Kanagawa 243-0197, Japan

• Kojima Yoshinori

  e-Shuttle, Inc., Kuwana, Mie 511-0192, Japan

• Takahashi Yasushi

  e-Shuttle, Inc., Kuwana, Mie 511-0192, Japan

• Sugatani Shinji

  e-Shuttle, Inc., Kuwana, Mie 511-0192, Japan

関連論文

• Characterization of Fogging and Develop-Loading Effects in Electron-Beam Direct-Writing Technology (Special Issue : Microprocesses and Nanotechnology)
• High-Throughput Electron Beam Direct Writing of VIA Layers by Character Projection with One-Dimensional VIA Characters
• A Structured Routing Architecture for Practical Application of Character Projection Method in Electron-Beam Direct Writing

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