Growth of Highly Oriented Silicon Films on Si(100) and Al_2O_3(0112) by Cathode-type rf Glow Discharge Method
スポンサーリンク
概要
著者
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NAKANISHI Yoichiro
Research Institute of Electronics, Shizuoka University
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Nakanishi Yoichiro
Research Institute Of Electronics Graduate School Of Electronic Science And Technology Shizuoka Univ
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Hatanaka Yoshinori
Research Institute Of Electronics Shizuoka University:graduate School Of Electric Science And Techno
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Hatanaka Yoshinori
Research Institute Of Electronics Graduate School Of Electronic Science And Technology Shizuoka Univ
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ISHIKAWA Kenji
Research Institute of Electronics, Shizuoka University
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JAYATISSA Ahalapitiya
Research Institute of Electronics, Shizuoka University
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Ishikawa Kenji
Research Institute Of Electronics Shizuoka University
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Jayatissa Ahalapitiya
Research Institute Of Electronics Shizuoka University
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