Deposition of Aluminum Nitride by Remote Plasma-Enhanced Chemical Vapor Deposition Using Triisobutyle Aluminum
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1992-04-01
著者
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NAKANISHI Yoichiro
Research Institute of Electronics, Shizuoka University
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Nakanishi Yoichiro
Research Institute Of Electronics Graduate School Of Electronic Science And Technology Shizuoka Univ
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Hatanaka Y
Research Institute Of Electronics Shizuoka University
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Hatanaka Yoshinori
Research Institute Of Electronics Shizuoka University:graduate School Of Electric Science And Techno
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Hatanaka Yoshinori
Research Institute Of Electronics Graduate School Of Electronic Science And Technology Shizuoka Univ
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MATSUMOTO Akihiro
Osaka Municipal Technical Research Institute
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Matsumoto Akinori
Research Institute Of Electronics Shizuoka University
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Meikle S
Research Institute Of Electronics Shizuoka University:(present Address) Micron Technology
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MEIKLE Scott
Research Institute of Electronics, Shizuoka University
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Meikle Scott
Research Institute Of Electronics Graduate School Of Electronic Science And Technology Shizuoka Univ
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