Properties of Sputter-Deposited CdS/CdTe Heterojunction Photodiode
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1994-06-15
著者
-
KAWAI Toshiaki
Hamamatsu Photonics K. K.
-
Hatanaka Y
Shizuoka Univ. Hamamatsu Jpn
-
Hatanaka Y
Research Institute Of Electronics
-
Hatanaka Y
Research Institute Of Electronics Shizuoka University
-
Hatanaka Yoshinori
Research Institute Of Electronics Shizuoka University:graduate School Of Electric Science And Techno
-
Hatanaka Yoshinori
Research Institute Of Electronics Graduate School Of Electronic Science And Technology Shizuoka Univ
-
Kawai Toshiaki
Hamamatsu Photonics K.k.
-
TOMITA Yasuhiro
Hamamatsu Photonics K.K.
-
Kawai Toshiaki
Hamamatsu Photonics
-
Tomita Y
Ntt Customer Equipment Department
関連論文
- Inhomogeneous Vasodilatory Responses of Rat Tail Arteries to Heat Stress : Evaluation by Synchrotron Radiation Microangiography
- Attempt at Two-Dimensional Mapping of X-ray Fluorescence from Breast Cancer Tissue
- Dependence of Cathodoluminescent and Electrical Properties of Phosphors with Conducting Layer by Sol-Gel Method on Layer Thickness
- Improvement of Low Voltage Cathodoluminescent Properties of Zinc Sulfide Phosphors by Sol-Gel Method
- Study of excimer laser doping process in CdTe
- Properties of Sputter-Deposited CdS/CdTe Heterojunction Photodiode
- Carrier Transport Properties of Sputter-Deposited CdS/CdTe Heterojunction
- Photo-Current Multiplication Phenomenon of Amorphous Silicon-Based Multilayer Photodiodes Fabricated on Crystalline Silicon Substrate : Semiconductors
- Laser Doping Technique for 2-6 Semiconductors,ZnSe and CdTe (第5回日韓台中情報ディスプレイ合同研究会(ASID '99)) -- (FED and EL Displays)
- Growth of Epitaxial ZnO Thin Film by Oxidation of Epitaxial ZnS Film on Si(111) Substrate
- Preparation of Heavily N-Type ZnSe Doped by Iodine in Remote Plasma Enhanced Metal Organic Chemical Vapor Deposition
- Growth of p-type ZnSe Films by Radical Assisted MOCVD Method
- Deposition of Aluminum Nitride by Remote Plasma-Enhanced Chemical Vapor Deposition Using Triisobutyle Aluminum
- Thin Film Deposition in the Afterglows of N_2 and H_2 Microwave Plasmas
- The Role of Hydrogen Atoms in Afterglow Deposition of Silicon Thin Films
- Preparation of ZnO Thin Films Deposited by Plasma Chemical Vapor Deposition for Application to Ultraviolet-cut Coating : Nuclear Science, Plasmas, and Electric Discharges
- Amorphous Silicon Avalanche Photodiode Films Using a Functionally Graded Superlattice Structure
- Amorphous Silicon Avalanche Photodiode Films Using Functionally Graded Superlattice Structure
- Gated Volcano-Shaped Field Emitters with Sharp Polycrystalline-Silicon Tips
- Growth of microcrystalline Si films in cathode-type rf GD at high SiH_4 concentration
- Preparation of Polycrystalline Silicon Thin Films by Cathode-Type RF Glow Discharge Method
- Growth of Highly Oriented Silicon Films on Si(100) and Al_2O_3(0112) by Cathode-type rf Glow Discharge Method
- Ultra-High-Sensitivity New Super-HARP Pickup Tube and Its Camera(Recent Progress in Photon Detection Technology)
- Growth of Y_2O_2S:Eu Thin Films by Reactive Magnetron Sputtering and Electroluminescent Characteristics
- Characteristics of Y_2O_3:Eu/ZnS/Y_2O_3:Eu Red Light Emitting Electroluminescent Devices
- Structure and Luminescent Property of Y_2O_2S:Eu Thin Films Prepared by Magnetron Sputtering
- X-Ray Imaging Sensor Using a Polycrystalline Cadmium Telluride-Hydrogenated Amorphous Silicon Heterojunction
- Optoelectrical Properties of Hydrogenated Amorphous Silicon-Polycrystalline Cadmium Telluride Heterojunctions
- Amorphous Silicon Resistive Sea for Silicon Vidicon Targets
- Low Temperature Fabrication of Thin Film Transistors using Microcrystalline Si Deposited by Cathode-Type RF Glow Discharge
- Optimum Gas Pressure of Soft Vacuum Pyroelectric Vidicon
- Lag and Resolution Related with Current Distribution of Electron Beam in Camera Tubes
- Influence of Bonding Wire on Electron Beam in Camera Tube with NEA Cold Cathode
- Remote Plasma Deposition of a-SiC:H Films Using Novel Source Material
- Mechanism of Plasma Assisted a-SiC:H Film Deposition
- Variation of Stress and Hardness of a-Sic:H Films with Film Composition
- Remote Plasma SiO_2 Deposition by Tetraethoxysilane with Chemically and Energetically Different Atomic Species
- Photoluminescent Properties of a-SiC:H Films Deposited by Organosilanes in Remote H2 Plasma
- Superiority of O(^1D) atom for solid and gas phase reactions over O(^3P) atom
- Properties of Atomic Oxygen obtained from Thermodynamically Non-equilibrium High Temperature Plasma
- XPS Studies of a-Si_C_x:H Prepared from C_2H_4/SiH_4 Gas Mixtures
- Thermal Diffusion of Bismuth Black Layer on PVF_2 Film
- Characteristics of the Hydrogenated Amorphous Silicon-Crystalline Cadmium Telluride Heterojunction Diode
- Emission Distributions from NEA Cold Cathodes
- Anisotropic Thermal Diffusion of PVDF Film : POLYMER MATERIALS
- Soft X-Ray Image Sensor Using Hydrogenated Amorphous Silicon
- Terminal Design for Audio-Visual Communication Services
- Attempt at Two-Dimensional Mapping of X-ray Fluorescence from Breast Cancer Tissue