Remote Plasma Deposition of a-SiC:H Films Using Novel Source Material
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概要
- 論文の詳細を見る
- 日本表面科学会の論文
- 1997-02-10
著者
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Wickramanayaka Sunil
静岡大 電子工研
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Wickramanayaka S
Anelva Corporation
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Hatanaka Y
Shizuoka Univ. Hamamatsu Jpn
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Hatanaka Y
Research Institute Of Electronics
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Hatanaka Y
Research Institute Of Electronics Shizuoka University
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Hatanaka Yoshinori
Research Institute Of Electronics Shizuoka University:graduate School Of Electric Science And Techno
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Hatanaka Yoshinori
Research Institute Of Electronics Graduate School Of Electronic Science And Technology Shizuoka Univ
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Sunil Wickramanayaka
静岡大学電子工学研究所
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WICKRAMANAYAKA Sunil
ANELVA Corporation
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Wrobel Aleksander
Polish Academy Of Sciences Center Of Molecular And Macromolecular Sciences
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Wrobel A.m.
Polish Academy Of Sciences Center Of Molecular And Macromolecular Studies
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WROBEL Alexander
Polish Academy of Sciences, Center of Molecular and Macromolecular Sciences
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Wickramanayaka Sunil
Anelva Corporation Head Office
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