Low Temperature Fabrication of Thin Film Transistors using Microcrystalline Si Deposited by Cathode-Type RF Glow Discharge
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1996-11-15
著者
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YAMAGUCHI Tomuo
Research Institute of Electronics, Shizuoka University
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NAKANISHI Yoichiro
Research Institute of Electronics, Shizuoka University
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Nakanishi Yoichiro
Research Institute Of Electronics Shizuoka University
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Nakanishi Yoichiro
Research Institute Of Electronics Graduate School Of Electronic Science And Technology Shizuoka Univ
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Hatanaka Yoshinori
Research Institute Of Electronics Shizuoka University:graduate School Of Electric Science And Techno
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Hatanaka Yoshinori
Research Institute Of Electronics Graduate School Of Electronic Science And Technology Shizuoka Univ
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Yamaguchi Tomuo
Research Institute Of Electronics Shizuoka University
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JAYATISSA Ahalopitiya
Research Institute of Electronics, Shizuoka University
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Jayatissa Ahalopitiya
Research Institute Of Electronics Shizuoka University
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