50 nm Pattern Etching of Si Wafer by Synchrotron Radiation Excited CF_4 Plasma
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1997-12-30
著者
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OGAWA Shinji
Department of Materials Science and Technology, Faculty of Science and Technology, Science Universit
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Yamada T
Tokyo Inst. Of Technol. Tokyo Jpn
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Yamada T
Tokyo Inst. Technol. Tokyo Jpn
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Ogawa Shinji
Department Of Electrical And Electronic Engineering And Information Engineering Nagoya University
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Yamada T
Daido Inst. Technol. Nagoya Jpn
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Yamada T
Sophia Univ. Tokyo Jpn
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Yamada T
Ntt Basic Research Laboratories:(present Address) Ntt Opto-electronics Laboratories
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Yamada T
Tokai Univ. Hiratsuka Jpn
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Yamada Tomoyuki
Research Laboratory Oki Electric Industry Co. Ltd.
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Morita Shigenori
Department Of Electronic Engineering Osaka University
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Yamada T
Department Of Electrical And Electronics Engineering Sophia University
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INANAMI Ryoichi
Department of Electrical and Electronic Engineering and Information Engineering, Nagoya University
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YAMADA Tomoya
Department of Electrical and Electronic Engineering and Information Engineering, Nagoya University
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OHSAKI Shintaro
Department of Electrical and Electronic Engineering and Information Engineering, Nagoya University
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MORITA Shinzo
Department of Electrical and Electronic Engineering and Information Engineering, Nagoya University
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Morita S
Department Of Electrical Engineering Nagoya University
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Ohsaki Shintaro
Department Of Electrical And Electronic Engineering And Information Engineering Nagoya University
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Inanami R
Department Of Electrical And Electronic Engineering And Information Engineering Nagoya University
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Inanami Ryoichi
Process & Manufacturing Engineering Center Semiconductor Company Toshiba Corp.
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OGAWA Shinji
Department of Cardiovascular Surgery, Toyohashi Heart Center
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