A New Pulsed Laser Deposition Method Using an Aperture Plate

概要

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A new off-axis pulsed laser deposition method using an aperture plate is proposed for the purpose of depositing high surface-quality Ta_2O_5 thin films without large fragments and/or droplets. The angular distribution of droplets and growth species emitted from the target is examined. Then, the oxygen pressure and laser energy dependencies of the number of droplets and the film thickness are also examined. The results indicate that the aperture plate plays an important role of limiting the path of the traveling droplets and of capturing the droplets traveling toward the off-axis substrate. On the other hand, the film deposition rate is not slow even when using the plate because the species pass through the aperture hole and reach the substrate by scattering. Using a 5 mm aperture plate, a good surface quality Ta_2O_5 film is obtained under the optimum condition of 200-300 mTorr oxygen pressure.
社団法人応用物理学会の論文
1997-02-15