White-Light Emission from Silicone Rubber Modified by 193 nm ArF Excimer Laser
スポンサーリンク
概要
- 論文の詳細を見る
The photochemical surface modification of silicone ([SiO(CH3)2]n) rubber has been successfully demonstrated using a 193 nm ArF excimer laser, and white light of strong intensity was emitted upon exposure to a 325 nm He–Cd laser. The photoluminescence spectra of the modified silicone showed broad peaks centered at 410, 550, and 750 nm wavelengths. The modified surface was carbon-free silicon oxide, and the chemical composition ratio of O/Si was approximately 2. However, the surface was not silica glass (SiO2), as clarified by IR spectroscopy. Instead, nanometer-size particles of silicon oxide were formed on the surface of the modified silicone rubber.
- Japan Society of Applied Physicsの論文
- 2007-04-25
著者
-
Inoue Narumi
Department Of Electrical And Elecronic Engineering National Defense Academy
-
Okoshi Masayuki
Department Of Electrical And Electronic Engineering National Defense Academy
-
Yamashita Tsugito
Department Of Applied Material And Life Science Kanto Gakuin University
-
Okoshi Masayuki
Department of Electrical and Electronic Engineering, National Defense Academy, 1-10-20 Hashirimizu, Yokosuka, Kanagawa 239-8686, Japan
-
Sekine Daisuke
Department of Applied Material and Life Science, Kanto Gakuin University, 1-50-1 Mutsuura-Higashi, Kanazawa-ku, Yokohama 236-8501, Japan
-
Yamashita Tsugito
Department of Applied Material and Life Science, Kanto Gakuin University, 1-50-1 Mutsuura-Higashi, Kanazawa-ku, Yokohama 236-8501, Japan
関連論文
- Refractive Index Control of SiO_2 Films by Pulsed Laser Deposition with Silicone Targets
- Photochemical Modification of Silicone Films Using F_2 Laser for Selective Chemical Etching
- Pulsed Laser Deposition of Polymethylphenylsilane Films by Optical-Parametric-Amplified Femtosecond Laser Pulses
- Pulsed Laser Deposition of Corrosion-Resistant Iron Thin Films
- An Analysis of EBIC Response of ITO/poly-Si Solar Cells : I-1: POLYCRISTALLINE SILICON SOLAR CELLS
- A New Pulsed Laser Deposition Method Using an Aperture Plate
- Annealing of Excimer-Laser-Ablated BaTiO_3 Thin Films
- Deposition of BaTiO_3 Thin Films by ArF Excimer Laser Ablation
- Thin Film Deposition of Photoluminescent Silicone Rubber by Pulsed Laser Deposition
- Photocatalytic TiO_2 Fine Particle Films Fabricated by Pulsed Laser Deposition
- Area-Selective Deposition of Diamond-Like Carbon Films onto Silicone Rubber by Femtosecond Laser
- Growth of Periodic SiO2 Nanostructures Using a 157 nm F2 Laser
- Fabrication of SiO_2-Humps on Silicone Rubber Using F_2 Laser : Optics and Quantum Electionics
- SiO_2 Humps Formed on Silicone Rubber by F_2 Laser Irradiation
- Pulsed Laser Deposition of SiO_2 Thin Films with Dimethylpolysiloxane Targets
- Laser Ablation of Silicone Rubber for Fabricating SiO_2 Thin Films : Optics and Queantum Electronics
- Comparison of Ta_2O_5 Thin Films Deposited by "Off-axis" and "On-axis" Pulsed Laser Deposition Technique
- n-InSb Point Contact Warm Carrier Infrared Laser Detectors : Waves, Optics and Quantum Electronics
- Bias Voltage Dependence of the Detected Voltage in MOM Devices
- F2 Laser Photochemical Welding of Aligned Silica Microspheres to Silicone Rubber
- Surface and Interface Modifications of Aluminum Thin Films on Silica Glass Substrate Using 157 nm F2 Laser for Selective Metallization
- Synthesis of Microcrystals from Frozen Acetone Irradiated by a Femtosecond Laser : Optics and Quantum Electronics
- Pulsed Laser Deposition of β-FeSi_2 Films
- Formation of Transparent SiO2 Protective Layer on Polycarbonate by 157 nm F2 Laser for Lightweight Automobile Window
- Controllable Change of Photoluminescence Spectra of Silicone Rubber Modified by 193 nm ArF Excimer Laser
- An Antenna-Coupled Warm Carrier Device Using Polycrystalline Ge Films : Waves, Optics and Quantum Electronics
- P-N Conversion of Poly-Ge Films Fabricated by Plasma Assisted Deposition
- CO_2 Laser Detection Using a Warm Carrier Device Fabricated by Evaporated Ge Films
- SiO2 Humps Formed on Silicone Rubber by F2 Laser Irradiation
- Adhesion Strength for Copper (Cu) Clad Laminate of Cu Foil / γ-aminopropyltrimethoxysilane (γ-APS) / Epoxy Resin
- Formation of High-Density Dislocations and Hardening in Femtosecond-Laser-Shocked Silicon
- Laser Wavelength Dependence on Photochemical Surface and Interface Modifications of Aluminum Thin Films on Silica Glass
- Fluorine-Doped SiO2 Films Made from Silicone and Polytetrafluoroethylene Using an F2 Laser
- Improvement of Photocatalytic Efficiency of TiO2 Thin Films Prepared by Pulsed Laser Deposition
- Ablation of Silicone Rubber Using UV-Nanosecond and IR-Femtosecond Lasers
- Wavelength Dependence of Femtosecond Pulsed Laser Deposition of Zinc Oxide Films
- Microlenses Fabricated on Silicone Rubber Using F2 Laser
- Photochemical Bonding of Aligned Silica Microspheres by F2-Laser-Induced Chemical Vapor Deposition
- White-Light Emission from Silicone Rubber Modified by 193 nm ArF Excimer Laser
- Photochemical Deposition of SiO2 Thin Films Using an F2 Laser
- Photochemical Modification of Silicone Films Using F2 Laser for Selective Chemical Etching
- Photochemical Surface Modification of Silicone Rubber into Photoluminescent Material by 193 nm ArF Excimer Laser Irradiation
- Femtosecond Laser Ablation of Polyethylene
- Effect of SPS Adsorption on the Copper Electrodeposition in Acid Copper Sulfate Bath
- Pulsed Laser Deposition of Polymethylphenylsilane Films by Optical-Parametric-Amplified Femtosecond Laser Pulses