Wavelength Dependence of Femtosecond Pulsed Laser Deposition of Zinc Oxide Films
スポンサーリンク
概要
- 論文の詳細を見る
We used 130-fs, 790-nm and frequency-doubled 395-nm laser pulses to study the wavelength dependence of femtosecond pulsed laser deposition of Al-doped ZnO films. The short wavelength pulses helped to increase deposition rates, decrease electrical resistivity of the films, and reduce droplets mixed into deposits. The transmission property of the films in the visible range was unchanged by the frequency doubling. The optical emission study showed a reduction of ion emissions and increase of kinetic energy when the 395-nm pulses were used.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 2001-03-15
著者
-
Okoshi Masayuki
Department Of Electrical And Electronic Engineering National Defense Academy
-
Hanabusa Mitsugu
Department Of Electrical And Electronic Engineering Toyohashi University Of Technology
-
Hanabusa Mitsugu
Department of Electrical and Electronic Engineering, Toyohashi University of Technology, Tenpaku, Toyohashi 441-8580, Japan
-
Higashikawa Kouji
Department of Electrical and Electronic Engineering, Toyohashi University of Technology, Tenpaku, Toyohashi 441-8580, Japan
-
Okoshi Masayuki
Department of Electrical and Electronic Engineering, Toyohashi University of Technology, Tenpaku, Toyohashi 441-8580, Japan
関連論文
- Refractive Index Control of SiO_2 Films by Pulsed Laser Deposition with Silicone Targets
- Photoinduced Deposition of Aluminum Thin Film on Silicon Nitride and Oxide
- Control of Reaction Mechanism of Photochemical Vapor Deposition of Aluminum Film by Timing of Source Introduction
- Pulsed Laser Deposition of Polymethylphenylsilane Films by Optical-Parametric-Amplified Femtosecond Laser Pulses
- Pulsed Laser Deposition of Corrosion-Resistant Iron Thin Films
- Deposition of Diamond-like Carbon Films by Pulsed-Laser Evaporation
- Thin Film Deposition of Photoluminescent Silicone Rubber by Pulsed Laser Deposition
- Photocatalytic TiO_2 Fine Particle Films Fabricated by Pulsed Laser Deposition
- Area-Selective Deposition of Diamond-Like Carbon Films onto Silicone Rubber by Femtosecond Laser
- Growth of Periodic SiO2 Nanostructures Using a 157 nm F2 Laser
- Fabrication of SiO_2-Humps on Silicone Rubber Using F_2 Laser : Optics and Quantum Electionics
- SiO_2 Humps Formed on Silicone Rubber by F_2 Laser Irradiation
- Pulsed Laser Deposition of SiO_2 Thin Films with Dimethylpolysiloxane Targets
- Laser Ablation of Silicone Rubber for Fabricating SiO_2 Thin Films : Optics and Queantum Electronics
- F2 Laser Photochemical Welding of Aligned Silica Microspheres to Silicone Rubber
- Surface and Interface Modifications of Aluminum Thin Films on Silica Glass Substrate Using 157 nm F2 Laser for Selective Metallization
- Selective Area Baser CVD of Silicon Nitride and Oxide and its Application to Microlenses
- Synthesis of Microcrystals from Frozen Acetone Irradiated by a Femtosecond Laser : Optics and Quantum Electronics
- Photochemical Vapor Deposition of Aluminum Thin Films Using Dimethylaluminum Hydride : Surfaces, Interfaces and Films
- Pulsed Laser Deposition of β-FeSi_2 Films
- Coherent Anti-Stokes Raman Spectroscopic Study of CO_2 Laser CVD of Silane
- Formation of Transparent SiO2 Protective Layer on Polycarbonate by 157 nm F2 Laser for Lightweight Automobile Window
- Controllable Change of Photoluminescence Spectra of Silicone Rubber Modified by 193 nm ArF Excimer Laser
- Nucleation and Film Growth in Photochemical Vapor Deposition of Aluminum Thin Film Using Dirnethylaluminum Hydride
- CO_2 Laser CVD of Disilane
- Time-Dependent X-Ray Photoelectron Spectroscopy Observed for Dimethylaluminum Hydride Adsorbed on SiO2
- Catalytic and Photoinduced Effects of Ti and TiO_2 Layers on Al Film Growth by Chemical Vapor Deposition
- SiO2 Humps Formed on Silicone Rubber by F2 Laser Irradiation
- Formation of High-Density Dislocations and Hardening in Femtosecond-Laser-Shocked Silicon
- Laser Wavelength Dependence on Photochemical Surface and Interface Modifications of Aluminum Thin Films on Silica Glass
- Fluorine-Doped SiO2 Films Made from Silicone and Polytetrafluoroethylene Using an F2 Laser
- Improvement of Photocatalytic Efficiency of TiO2 Thin Films Prepared by Pulsed Laser Deposition
- Ablation of Silicone Rubber Using UV-Nanosecond and IR-Femtosecond Lasers
- CARS Spectroscopy of SiH_4 and Si_2H_6 in Supersonic Free Jets
- Wavelength Dependence of Femtosecond Pulsed Laser Deposition of Zinc Oxide Films
- Microlenses Fabricated on Silicone Rubber Using F2 Laser
- Photochemical Bonding of Aligned Silica Microspheres by F2-Laser-Induced Chemical Vapor Deposition
- White-Light Emission from Silicone Rubber Modified by 193 nm ArF Excimer Laser
- Photochemical Deposition of SiO2 Thin Films Using an F2 Laser
- Photochemical Modification of Silicone Films Using F2 Laser for Selective Chemical Etching
- Photochemical Surface Modification of Silicone Rubber into Photoluminescent Material by 193 nm ArF Excimer Laser Irradiation
- Femtosecond Laser Ablation of Polyethylene
- Pulsed Laser Deposition of Polymethylphenylsilane Films by Optical-Parametric-Amplified Femtosecond Laser Pulses