Catalytic and Photoinduced Effects of Ti and TiO_2 Layers on Al Film Growth by Chemical Vapor Deposition
スポンサーリンク
概要
- 論文の詳細を見る
In chemical vapor deposition using dimethylaluminum hydride, Al thin films could be grown even at a substrate temperature of 60℃ on catalytic Ti layers at a rate of 0.5 nm/min without UV irradiation. Scanning tunneling microscopy revealed a dense formation of Al islands on the Ti surface at the initial stage of Al deposition. In contrast, the catalytic reaction induced by TiO_2 layers was weak, and the Al films were deposited at 120℃ only in the presence of UV light generated by a deuterium lamp.
- 社団法人応用物理学会の論文
- 1995-11-01
著者
-
Hanabusa Mitsugu
Department Of Electrical And Electronic Engineering Toyohashi University Of Technology
-
NITTA Toshinari
Department of Electrical and Electronic Engineering, Toyohashi University of Technology
-
NISHITANI Kouji
Department of Electrical and Electronic Engineering, Toyohashi University of Technology
-
Nishitani K
Department Of Electrical And Electronic Engineering Toyohashi University Of Technology
-
Nitta Toshinari
Department Of Electrical And Electronic Engineering Toyohashi University Of Technology:(present Addr
関連論文
- Photoinduced Deposition of Aluminum Thin Film on Silicon Nitride and Oxide
- Control of Reaction Mechanism of Photochemical Vapor Deposition of Aluminum Film by Timing of Source Introduction
- Pulsed Laser Deposition of Corrosion-Resistant Iron Thin Films
- Deposition of Diamond-like Carbon Films by Pulsed-Laser Evaporation
- Selective Area Baser CVD of Silicon Nitride and Oxide and its Application to Microlenses
- Synthesis of Microcrystals from Frozen Acetone Irradiated by a Femtosecond Laser : Optics and Quantum Electronics
- Photochemical Vapor Deposition of Aluminum Thin Films Using Dimethylaluminum Hydride : Surfaces, Interfaces and Films
- Pulsed Laser Deposition of β-FeSi_2 Films
- Coherent Anti-Stokes Raman Spectroscopic Study of CO_2 Laser CVD of Silane
- Nucleation and Film Growth in Photochemical Vapor Deposition of Aluminum Thin Film Using Dirnethylaluminum Hydride
- CO_2 Laser CVD of Disilane
- Time-Dependent X-Ray Photoelectron Spectroscopy Observed for Dimethylaluminum Hydride Adsorbed on SiO2
- Catalytic and Photoinduced Effects of Ti and TiO_2 Layers on Al Film Growth by Chemical Vapor Deposition
- CARS Spectroscopy of SiH_4 and Si_2H_6 in Supersonic Free Jets
- Wavelength Dependence of Femtosecond Pulsed Laser Deposition of Zinc Oxide Films