Selective Area Baser CVD of Silicon Nitride and Oxide and its Application to Microlenses
スポンサーリンク
概要
- 論文の詳細を見る
Selective area deposition of silicon oxide and nitride films was achieved by laser CVD based on pyrolysis. The dielectric films prepared on quartz substrates from SiH_4/NH_3 and SiH_4/N_2O mixtures using a CO_2 laser were smaller in size than the beam, and their thickness profile could be reproduced from a predicted surface temperature distribution and observed temperature dependence of deposition rates. Thickness profile of oxide films was quite different when a SiH_4/O_2 mixture was used. Microlenses with focal lengths as short as 0.6 mm were fabricated by the present technique.
- 社団法人応用物理学会の論文
- 1987-01-20
著者
-
HANABUSA Mitsugu
Department of Electrical and Electronic Engineering, Toyohashi University of Technology
-
Hanabusa Mitsugu
Department Of Electrical And Electronic Engineering Toyohashi University Of Technology
-
SUGIMURA Atsuhiko
Department of Electrical and Electronic Engineering, Toyohashi University of Technology
-
Sugimura Atsuhiko
Department Of Electrical And Electronic Engineering Toyohashi University Of Technology
関連論文
- Photoinduced Deposition of Aluminum Thin Film on Silicon Nitride and Oxide
- Control of Reaction Mechanism of Photochemical Vapor Deposition of Aluminum Film by Timing of Source Introduction
- Pulsed Laser Deposition of Corrosion-Resistant Iron Thin Films
- Deposition of Diamond-like Carbon Films by Pulsed-Laser Evaporation
- Selective Area Baser CVD of Silicon Nitride and Oxide and its Application to Microlenses
- Synthesis of Microcrystals from Frozen Acetone Irradiated by a Femtosecond Laser : Optics and Quantum Electronics
- Photochemical Vapor Deposition of Aluminum Thin Films Using Dimethylaluminum Hydride : Surfaces, Interfaces and Films
- Pulsed Laser Deposition of β-FeSi_2 Films
- Coherent Anti-Stokes Raman Spectroscopic Study of CO_2 Laser CVD of Silane
- Nucleation and Film Growth in Photochemical Vapor Deposition of Aluminum Thin Film Using Dirnethylaluminum Hydride
- CO_2 Laser CVD of Disilane
- Time-Dependent X-Ray Photoelectron Spectroscopy Observed for Dimethylaluminum Hydride Adsorbed on SiO2
- Catalytic and Photoinduced Effects of Ti and TiO_2 Layers on Al Film Growth by Chemical Vapor Deposition
- CARS Spectroscopy of SiH_4 and Si_2H_6 in Supersonic Free Jets
- Wavelength Dependence of Femtosecond Pulsed Laser Deposition of Zinc Oxide Films