Photochemical Vapor Deposition of Aluminum Thin Films Using Dimethylaluminum Hydride : Surfaces, Interfaces and Films
スポンサーリンク
概要
- 論文の詳細を見る
Using dimethylaluminum hydride as a source gas, aluminum thin films with low-electrical resistivity were deposited via photochemical reactions induced by a deuterium lamp. The best resistivity was 6.2μΩ・cm, which was as low as 2.3 times the value of bulk aluminum. Deposition rates increased with substrate temperature. At 200℃ the rate was 20 nm/min. A disk-like thickness profile, as well as the vapor pressure dependence of deposition rates, indicated that surface reactions dominated.
- 社団法人応用物理学会の論文
- 1988-08-20
著者
-
HANABUSA Mitsugu
Department of Electrical and Electronic Engineering, Toyohashi University of Technology
-
Oikawa Akira
Department Of Electrical And Electronic Engineering Toyohashi University Of Technology
-
Hanabusa Mitsugu
Department Of Electrical And Electronic Engineering Toyohashi University Of Technology
-
HAYAKAWA Kikuo
Department of Electrical and Electronic Engineering, Toyohashi University of Technology
-
MAEDA Katsunori
Department of Electrical and Electronic Engineering, Toyohashi University of Technology
-
Maeda Katsunori
Department Of Electrical And Electronic Engineering Toyohashi University Of Technology
-
Hayakawa Kikuo
Department Of Electrical And Electronic Engineering Toyohashi University Of Technology
関連論文
- Photoinduced Deposition of Aluminum Thin Film on Silicon Nitride and Oxide
- Control of Reaction Mechanism of Photochemical Vapor Deposition of Aluminum Film by Timing of Source Introduction
- Pulsed Laser Deposition of Corrosion-Resistant Iron Thin Films
- Deposition of Diamond-like Carbon Films by Pulsed-Laser Evaporation
- Selective Area Baser CVD of Silicon Nitride and Oxide and its Application to Microlenses
- Synthesis of Microcrystals from Frozen Acetone Irradiated by a Femtosecond Laser : Optics and Quantum Electronics
- Photochemical Vapor Deposition of Aluminum Thin Films Using Dimethylaluminum Hydride : Surfaces, Interfaces and Films
- Pulsed Laser Deposition of β-FeSi_2 Films
- Coherent Anti-Stokes Raman Spectroscopic Study of CO_2 Laser CVD of Silane
- Nucleation and Film Growth in Photochemical Vapor Deposition of Aluminum Thin Film Using Dirnethylaluminum Hydride
- P6-58 Metabolome analysis in amiodarone-induced phospholipidosis of rat(TOXICOGENOMICS)(GENERAL SESSION BY POSTER PRESENTATION)(Proceedings of the 31st Annual Meeting)
- CO_2 Laser CVD of Disilane
- Time-Dependent X-Ray Photoelectron Spectroscopy Observed for Dimethylaluminum Hydride Adsorbed on SiO2
- Catalytic and Photoinduced Effects of Ti and TiO_2 Layers on Al Film Growth by Chemical Vapor Deposition
- CARS Spectroscopy of SiH_4 and Si_2H_6 in Supersonic Free Jets
- Wavelength Dependence of Femtosecond Pulsed Laser Deposition of Zinc Oxide Films