Atomic Structure of Hydrogen-Terminated Si(111) Surfaces by Hydrofluoric Acid Treatments
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1991-12-30
著者
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MIKI Kazushi
Research Center for Advanced Carbon Materials and Nanotechnology Research Institute National Institu
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MIKI Kazushi
Nanotechnology Research Institute-AIST
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TOKUMOTO Hiroshi
Electrotechmical Laboratory
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MIKI Kazushi
Electrotechnical Laboratory (ETL)
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MORITA Yukinori
National Institute for Advanced Interdisciplinary Research
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Morita Y
Matsushita Electric Industrial Co. Ltd. Osaka Jpn
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Tokumoto Hiroshi
Jrcat National Institute For Advanced Interdisciplinary Research
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Tokumoto Hiroshi
Elecltrotechnical Laboratory
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Tokumoto Hiroshi
Electrotechnical Laboratory (etl)
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Tokumoto Hiroshi
Joint Research Center For Atom Technology (jrcat)
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Tokumoto Hiroshi
Joint Research Center For Atom Technology (jrcat):national Institute Of Advanced Industrial Science
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Tokumoto Hiroshi
Joint Research Center For Atom Technology (jrcat)-national Institute Of Advanced Industrial Science
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Miki K
Electrotechnical Laboratory (etl)
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Miki Kazushi
National Institute Of Materials Science (nims)
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Miki Kazushi
Aist
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Miki Kazushi
Nanoarchitecture Group Organic Nanomaterials Center National Institute For Materials Science
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Miki Kazushi
Electrotechnical Laboratory
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Morita Y
Consortium Fuer Elektrochemishe Ind. Gmbh Muenchen Deu
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MORITA Yukinori
Electrotechnical Laboratory
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Tokumoto Hiroshi
Electrotechincal Laboratory
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