Morita Y | Consortium Fuer Elektrochemishe Ind. Gmbh Muenchen Deu
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概要
関連著者
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MORITA Yukinori
National Institute for Advanced Interdisciplinary Research
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Morita Y
Matsushita Electric Industrial Co. Ltd. Osaka Jpn
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Morita Y
Consortium Fuer Elektrochemishe Ind. Gmbh Muenchen Deu
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TOKUMOTO Hiroshi
Electrotechmical Laboratory
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Tokumoto Hiroshi
Jrcat National Institute For Advanced Interdisciplinary Research
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Tokumoto Hiroshi
Elecltrotechnical Laboratory
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Tokumoto Hiroshi
Electrotechnical Laboratory (etl)
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Tokumoto Hiroshi
Joint Research Center For Atom Technology (jrcat)
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Tokumoto Hiroshi
Joint Research Center For Atom Technology (jrcat):national Institute Of Advanced Industrial Science
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Tokumoto Hiroshi
Joint Research Center For Atom Technology (jrcat)-national Institute Of Advanced Industrial Science
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Morita Yukinori
National Inst. Of Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn
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MIKI Kazushi
Research Center for Advanced Carbon Materials and Nanotechnology Research Institute National Institu
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MIKI Kazushi
Nanotechnology Research Institute-AIST
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MIKI Kazushi
Electrotechnical Laboratory (ETL)
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Miki K
Electrotechnical Laboratory (etl)
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Miki Kazushi
National Institute Of Materials Science (nims)
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Miki Kazushi
Aist
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Miki Kazushi
Nanoarchitecture Group Organic Nanomaterials Center National Institute For Materials Science
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Miki Kazushi
Electrotechnical Laboratory
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Tokumoto Hiroshi
Electrotechincal Laboratory
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ANDO Akira
National Institute for Fusion Science
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Ando Akira
Murata Mfg. Co. Ltd.
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Matsumoto K
Electrotechnical Lab. Ibaraki‐kenn Jpn
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Matsumoto Kazuhiko
Electrotechnical Laboratory (etl)
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Matsumoto Kazuhiko
Advanced Industrial Science And Technology:tsukuba University:crest
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ANDO Atsushi
Electrotechnical Laboratory (ETL)
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Matsumoto Kazuhiko
Electrotechnical Laboratory (elt)
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Matsumoto Kazuhisa
Sumitomo Electric Industries Ltd.
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Shimizu Tadao
Department Of Physics University Of Tokyo
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Shimizu T
Department Of Electrical And Electronic Engineering Kanazawa University
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Ando A
Murata Mfg. Co. Ltd.
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Shimizu T
Chiba Univ. Chiba Jpn
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Matsumoto Kazuhiko
Electrotechnical Laboratory
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山田 弘司
核融合科学研究所
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山田 啓文
京都大学工学研究科電子工学専攻
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KAGESHIMA Masami
Department of Applied Physics, Graduate School of Engineering, Osaka University
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Kageshima M
National Inst. Advanced Industrial Sci. And Technol. (aist) Ibaraki Jpn
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Kageshima Masami
Joint Research Center For Atom Technology National Institute Of Advanced Industrial Science And Tech
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Kageshima M
Joint Research Center For Atom Technology (jrcat)
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Kageshima Masami
Department Of Applied Physics Graduate School Of Engineering Osaka University
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NAKAYAMA Kan
National Research Laboratory of Metrology
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Hamada Y
Nagoya Municipal Industrial Res. Inst. Nagoya Jpn
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KAWAZU Akira
Department of Applied Physics, The University of Tokyo
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Nakayama Kazuhiko
Mechanical Processing Technology Research Laboratories Kao Corporation
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YAMADA Hirofumi
National Research Laboratory of Metrology
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TOKUMOTO Hiroshi
National Institute for Advanced Interdisciplinary Research
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Kawazu A
Department Of Applied Physics University Of Tsukuba
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Kawazu Akira
Department Of Applied Physics Faculty Of Engineering University Of Tokyo:(present Address) Komatsu E
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Nakayama K
National Inst. Advanced Industrial Technol. And Sci. Ibaraki Jpn
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SHIMIZU Tetsuo
National Institute for Advanced Interdisciplinary Research (NAIR)
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Yamaguchi M
Department Of Physics Yokohama National University
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Iida S
Nagaoka Univ. Technol. Nagaoka Jpn
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Iida S
Toyama Univ. Toyama Jpn
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Iida Shinya
Speedfam Co. Ltd.
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Shimizu Tetsuo
Electrotechnical Laboratory (ETL)
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MORITA Yoshimitsu
PTM Project, Systems Division, USHIO Inc.
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YAMAGUCHI Masanori
PTM Project, Systems Division, USHIO Inc.
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IIDA Shinya
PTM Project, Systems Division, USHIO Inc.
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NITAMI Kenji
Process Engineering Section, LSI Process Technology Department, Integrated Circuit Division, Electro
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MORITA Yukinori
Electrotechnical Laboratory
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Nitami Kenji
Process Engineering Section Lsi Process Technology Department Integrated Circuit Division Electronic
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Yamaguchi Masanori
Ptm Project Systems Division Ushio Inc.
著作論文
- Tip-Induced Surface Disorder on Hydrogen-Terminated Silicon(111) Surface Observed by Ultrahigh-Vacuum Atomic Force Microscopy
- Observation of Hydrogen-Terminated Silicon (111) Surface by Ultrahigh-Vacuum Atomic Force Microscopy
- Surface Observation and Modification of Si Substrate in NH_4F and H_2SO_4 Solutions
- Surface Observation and Modification of Si Substrate in Solutions
- Electrochemical Scanning Tunneling Microscopy and Atomic Force Microscopy Observationson Si(111) in Several Solutions
- Submicron Particles Observed during Etching Process
- Atomic Structure of Hydrogen-Terminated Si(111) Surfaces by Hydrofluoric Acid Treatments