Low Dielectric Constant Fluorinated Oxide Films Prepared by Remote Plasma Chemical Vapor Deposition

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概要

• 論文の詳細を見る
• 1995-08-21

著者

• LEE Seung

  Department of Dermatology and Human Barrier Research Institute, Yonsei University College of Medicin

• Park Min

  Micro Electronics Technology Lab., Electronics and Telecommunications Research Institute

• Jeong Jee-Won

  Electronic Materials and Devices Research Center Korea Institute of Science and Technology

• Jang Jin

  Department of Physics, Kyunghee University Hoigi-dong

• Jang J

  Kyunghee University

• Park M

  Micro Electronics Technology Lab. Electronics And Telecommunications Research Institute

• Jang Jin

  Department Of Physics Kyunghee University

• Jang Jin

  Department Of Biochemistry School Of Medicine Kyungpook National University

• Park Min

  Semiconductor Div., Electronics and Telecommunications Research Institute

• Baek Jong

  Semiconductor Technology Division Electronics And Telecommunications Research Institute

• Bark Jong

  Semiconductor Division Electronics And Telecommunications Research Institute

• Baek Jong

  Semiconductor Division Electronics And Telecommunications Research Institute

• Park Kyu

  Department Of Physics Kyung Hee University

• Jang J

  Kyunghee Univ. Seoul Kor

• Park Kyu

  Department Of Eecs

• Jang J

  Korea Institute Of Science And Technology

• Lee Seung

  Department Of Anesthesiology And Pain Medicine Dong-a University Hospital

• Lee S

  Department Of Physics Kyung Hee University

• Park Kyu

  Department Of Agrobiology Kangweon National University

• PARK Kyu

  Department of Physics, Kyung Hee University

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