Characteristics of SiOF Films Formed by Remote Plasma Enhanced Chemical Vapor Deposition with SF_6 Gas
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1996-06-15
著者
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Yu Byoung-Gon
Semiconductor Division, ETRI,
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Kim Kwang-ho
Department Of Semiconductor Engineering Cheongju University
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Yu Byoung-gon
Semiconductor Division Electronics And Telecommunications Research Institute
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Suh Kyung-soo
Semiconductor Technology Division Electronics And Telecommunications Research Institute
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Baek Jong
Semiconductor Technology Division Electronics And Telecommunications Research Institute
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Baek Jong
Semiconductor Division Electronics And Telecommunications Research Institute
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Kim Kwang-ho
Department Of Architecture Inha University
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Kim Kwang-Ho
Department of Semiconductor Engineering, Cheongju University
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Yu Byoung-Gon
Semiconductor Division, Electronics and Telecommunications Research Institute
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SUH Kyung-Soo
Semiconductor Division, Electronics and Telecommunications Research Institute
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