Characterization and Removal of Trace Heavy Metal Contamination on Si-Surface Resulted from CHF_3/C_2F_6 Reactive Ion Etching
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1997-04-15
著者
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Lee C
Electronics And Telecommunications Res. Inst. Taejon Kor
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Yoo Hyung
Semiconductor Tehnology Division, Electronics and Telecommunications Research Institute
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Yoo Hyung
Semiconductor Technology Division Electronics And Telecommunications Research Institute
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Yoo Hyung
Semiconductor Division Etri
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Baek Jong
Semiconductor Technology Division Electronics And Telecommunications Research Institute
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Baek Jong
Semiconductor Division Electronics And Telecommunications Research Institute
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LEE Chun
Semiconductor Technology Division, Electronics and Telecommunications Research Institute
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KANG Seung
Semiconductor Technology Division, Electronics and Telecommunications Research Institute
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WOO Seong
Department of Chemical Engineering, Korea Advanced Institute of Science and Technology
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Woo Seong
Department Of Chemical Engineering Korea Advanced Institute Of Science And Technology
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Kang Seung
Semiconductor Technology Division Electronics And Telecommunications Research Institute
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