Electron Beam Damage in the SiN Membrane of an X-Ray Lithography Mask
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1998-01-15
著者
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Kim Bo
Semiconductor Division, ETRI,
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Kim Jong-soo
Semiconductor Technology Division Electronics And Telecommunications Research Institute
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Chung Hai
Semiconductor Tehnology Division, Electronics and Telecommunications Research Institute
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Choi Sang-Soo
Semiconductor Tehnology Division, Electronics and Telecommunications Research Institute
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Yoo Hyung
Semiconductor Tehnology Division, Electronics and Telecommunications Research Institute
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Yoo Hyung
Semiconductor Division Etri
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Kim Bo
Semiconductor Technology Division Electronics And Telecommunications Research Institute
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Chung Hai
Semiconductor Technology Division Electronics And Telecommunications Research Institute
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Choi Sang-soo
Semiconductor Technology Division Electronics And Telecommunications Research Institute
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- Electron Beam Damage in the SiN Membrane of an X-Ray Lithography Mask
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