Deposition of Hydrogen-Free Diamond-Like Carbon Film and Its Application to Field Emission Devices

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概要

• 論文の詳細を見る

• Hydrogen-free Diamond-Like Carbon (DLC) films were deposited by layer-by-layer technique using plasma enhanced chemical vapor deposition, i.e., deposition of thin DLC layer and subsequent CF_4 plasma exposure on its surface alternatively. The hydrogen-free DLC film could be grown at 20O sec CF_4 plasma exposure on 5 nm DLC layer. The layer-by-layer deposited, hydrogen-free DLC film shows an efficient electron emission; the onset field emission was found to be 18 V/μm and a barrier energy for emission to be 0.06 eV.

• 社団法人電子情報通信学会の論文
• 1995-10-24

著者

• Jeong Jee-Won

  Electronic Materials and Devices Research Center Korea Institute of Science and Technology

• Jang Jin

  Department of Physics, Kyunghee University Hoigi-dong

• Jang J

  Kyunghee University

• Jang Jin

  Department Of Physics Kyunghee University

• Jang Jin

  Department Of Biochemistry School Of Medicine Kyungpook National University

• Moon Jong

  Department Of Materials Science And Engineering Chonnam National University

• Moon Jong

  Department Of Ceramic Engineering Chonnam National University

• Moon Jong

  Department Of Physics Kyung Hee University

• Park Kyu

  Department Of Physics Kyung Hee University

• Jang J

  Kyunghee Univ. Seoul Kor

• Park Kyu

  Department Of Eecs

• Jang J

  Korea Institute Of Science And Technology

• Park Kyu

  Department Of Agrobiology Kangweon National University

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