Low Dielectric Constant Fluorinated Oxide Films Prepared by Remote Plasma Chemical Vapor Deposition
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概要
- 論文の詳細を見る
- 1996-02-01
著者
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LEE Seung
Department of Dermatology and Human Barrier Research Institute, Yonsei University College of Medicin
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Jeong Jee-Won
Electronic Materials and Devices Research Center Korea Institute of Science and Technology
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Jang Jin
Department of Physics, Kyunghee University Hoigi-dong
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Park M
Micro Electronics Technology Lab. Electronics And Telecommunications Research Institute
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Jang Jin
Department Of Physics Kyunghee University
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Jang Jin
Department Of Biochemistry School Of Medicine Kyungpook National University
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Park Min
Semiconductor Div., Electronics and Telecommunications Research Institute
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Bark Jong
Semiconductor Division Electronics And Telecommunications Research Institute
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Park Kyu
Department Of Physics Kyung Hee University
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Jang J
Kyunghee Univ. Seoul Kor
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Park Kyu
Department Of Eecs
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Jang J
Korea Institute Of Science And Technology
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Lee Seung
Department Of Anesthesiology And Pain Medicine Dong-a University Hospital
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Lee S
Department Of Physics Kyung Hee University
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Park Kyu
Department Of Agrobiology Kangweon National University
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