Deposition and Characterization of Ta, TaN_x and Ta_4B Films for Next-Generation Lithography Mask Applications
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-12-30
著者
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Park Chang
Department of Chemical and Biochemical Engineering, Dongguk University
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LEE Seung
Department of Dermatology and Human Barrier Research Institute, Yonsei University College of Medicin
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AHN Jinho
Department of Materials Science and Engineering, Hanyang University
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Ahn Jinho
Department Of Materials Engineering Graduate School Of Advanced Materials And Chemical Engineering H
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Park Chang
Department Of Anatomic Pathology Chonnam National University Medical School
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Lee Seung
Department Of Materials Engineering Hanyang University
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Lee Seung
Department Of Anesthesiology And Pain Medicine Dong-a University Hospital
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Park Chang
Department Of Materials Engineering Hanyang University
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Ahn Jinho
Department of Material Science and Engineering, Hanyang University, 17 Haengdang-dong, Seongdong-gu, Seoul 133-791, Korea
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