Effects of SF_6 Addition to O_2 Plasma on Polyimide Etching
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概要
- 論文の詳細を見る
- 2000-12-30
著者
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KIM Sang
Department of Metallic and Materials Engineering, Gyeongsang National University
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Kim S
Photonics Research Center Korea Institute Of Science And Technology
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Kim Sun
Photonics Research Center Korea Institute Of Science And Technology
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AHN Jinho
Department of Materials Science and Engineering, Hanyang University
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Kim S
Korea Inst. Sci. And Technol. Seoul Kor
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Kim S
Hanyang Univ. Seoul Kor
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Ahn J
Materials Science And Engineering Hanyang University
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Ahn Jinho
Deptartment Of Materials Engineering Hanyang University
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Ahn Jinho
Department Of Materials Engineering Graduate School Of Advanced Materials And Chemical Engineering H
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Woo S‐g
Samsung Electronic Co. Ltd. Kyunggi‐do Kor
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Ahn J
Department Of Materials Science & Engineering Hanyang University
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WOO Sang-Gyun
Department of Materials Engineering, Hanyang University
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Kim Sang
Department Of Chem. Eng. The University Of Seoul
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KIM Sang
Department of Anesthesiology and Pain Medicine, Chosun University Medical School
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Ahn Jinho
Department of Material Science and Engineering, Hanyang University, 17 Haengdang-dong, Seongdong-gu, Seoul 133-791, Korea
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AHN Jinho
Department of Computer Science, Kyonggi University
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KIM Sang
Department of Agricultural Biotechnology, Seoul National University
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