Etching Characteristics of Fine Ta Patterns with Electron Cyclotron Resonance Chlorine Plasma
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-12-30
著者
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Kim S
Photonics Research Center Korea Institute Of Science And Technology
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Kim Sun
Photonics Research Center Korea Institute Of Science And Technology
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Kim S
Korea Inst. Sci. And Technol. Seoul Kor
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Kim S
Hanyang Univ. Seoul Kor
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Ahn J
Materials Science And Engineering Hanyang University
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Ahn Jinho
Deptartment Of Materials Engineering Hanyang University
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Woo S‐g
Samsung Electronic Co. Ltd. Kyunggi‐do Kor
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Woo Sang-gyun
Deptartment Of Materials Engineering Hanyang University
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Ahn J
Department Of Materials Science & Engineering Hanyang University
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KIM Sang
Deptartment of Materials Engineering, Hanyang University
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JU Sup-Youl
Deptartment of Materials Engineering, Hanyang University
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SON Joo-Hiuk
Department of Physics, University of Seoul
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Ju S‐y
Hanyang Univ. Seoul Kor
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Son Joo-hiuk
Department Of Physics University Of Seoul
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Ju Sup-youl
Deptartment Of Materials Engineering Hanyang University
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