Enhancement of Extreme Ultraviolet Reflective Multilayer Properties by the Insertion of Ru Barrier Layer

スポンサーリンク

概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2003-06-30

著者

• KIM Tae

  Division of Cardiology, Severance Cardiovascular Hospital, Yonsei University College of Medicine

• Lee S

  Department Of Materials Science & Engineering Hanyang University

• Ahn Jinho

  Division Of Materials Science And Engineering Hanyang University

• Ahn J

  Department Of Materials Science & Engineering Hanyang University

• LEE Seung

  Division of Materials Science and Engineering, Hanyang University

関連論文

• Comparison of Neointimal Coverage of Sirolimus-Eluting Stents and Paclitaxel-Eluting Stents Using Optical Coherence Tomography at 9 Months After Implantation
• Microstructure of YBa_2Cu_3O_ Superconductor Synthesized with Y_2BaCuO_5, BaCuO_2 and CuO
• The Reaction Sequence in the System Y_2BaCuO_5-BaCuO_2-CuO for YBa_2Cu_3O_ Formation
• Key Technology Development for EUVL Mask Fabrication(Session A8 Nano-Lithography)(2004 Asia-Pasific Workshop on Fundamentals and Application of Advanced Semiconductor Devices (AWAD 2004))
• Key Technology Development for EUVL Mask Fabrication(Session A8 Nano-Lithography)(2004 Asia-Pasific Workshop on Fundamentals and Application of Advanced Semiconductor Devices (AWAD 2004))
• Highly Anisotropic Etching of Tungsten-Nitride for an X-Ray Mask Absorber with an Inductively Coupled Plasma System
• Structural Characterization of a Mo/Ru/Si Extreme Ultraviolet (EUV) Reflector by Optical Modeling
• Analysis of Multilayer Structure for Reflection of Extreme-Ultraviolet Wavelength
• Current and future program of EUVL in Korea
• Current and future program of EUVL in Korea
• Numerical Investigation of Defect Printability in Extreme Ultraviolet (EUV) Reflector : Ru/Mo/Si Multilayer System
• Effects of SF_6 Addition to O_2 Plasma on Polyimide Etching
• Enhancement of Extreme Ultraviolet Reflective Multilayer Properties by the Insertion of Ru Barrier Layer
• Etching Characteristics of Fine Ta Patterns with Electron Cyclotron Resonance Chlorine Plasma
• Study on the Properties of Interlayer Low Dielectric Polyimide during Cl-Based Plasma Etching of Aluminum
• GaN-Based White-Light-Emitting Diodes Fabricated with a Mixture of Ba_3MgSi_2O_8 : Eu^ and Sr_2SiO_4 : Eu^ Phosphors
• Chemical Reaction During Pt Etching with SF_6/Ar and Cl_2/Ar Plasma Chemistries
• Application of Adaptive Evolutionary Algorithm to Economic Load Dispatch with Nonconvex Cost Functions
• Design of unique two-bit/cell SONOS flash memory device utilizing an advanced saddle structure(Session4A: Nonvolatile Memory)
• Design of unique two-bit/cell SONOS flash memory device utilizing an advanced saddle structure(Session4A: Nonvolatile Memory)
• Combined CD137 (4-1BB) and adjuvant therapy generates a developing pool of peptide-specific CD8 memory T cells
• Chemical Reaction During Pt Etching with SF6/Ar and Cl2/Ar Plasma Chemistries
• Suppressed Thermally Induced Flatband Voltage Instabilities with Binary Noble Metal Gated Metal--Oxide--Semiconductor Capacitors
• Enhancement of Extreme Ultraviolet Reflective Multilayer Properties by the Insertion of Ru Barrier Layer
• Efficacy of intravenously administered ibandronate in postmenopausal Korean women with insufficient response to orally administered bisphosphonates

もっと見る 閉じる

スポンサーリンク