Enhancement of Extreme Ultraviolet Reflective Multilayer Properties by the Insertion of Ru Barrier Layer
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概要
- 論文の詳細を見る
Extreme ultraviolet (EUV) reflective multilayers that contain a Ru barrier layer at the Mo-on-Si interface were deposited by multitarget magnetron sputtering. The microstructure, stacking quality, and optical properties of these multilayers were analyzed by X-ray diffraction (XRD), transmission electron microscope (TEM), and EUV reflectometry. The multilayers with a Ru barrier showed a more distinct Ru-on-Si interface and suppressed interfacial mixing during deposition. As a result, the peak reflectivity and Full width at half maximum (FWHM) were improved by 1.7% and 50%, respectively, as compared to the conventional Mo/Si multilayer structure.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-06-15
著者
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Kim Tae
Division Of Cardiology Severance Cardiovascular Hospital Yonsei University College Of Medicine
-
Ahn Jinho
Division Of Materials Science And Engineering Hanyang University
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LEE Seung
Division of Materials Science and Engineering, Hanyang University
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Ahn Jinho
Division of Materials Science and Engineering, Hanyang University, 17 Haengdang-dong, Seongdong-gu, Seoul, 133-791, Korea
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Lee Seung
Division of Materials Science and Engineering, Hanyang University, 17 Haengdang-dong, Seongdong-gu, Seoul, 133-791, Korea
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