Cyclopropyl-containing Photoacid Generators for Chemically Amplified Resists
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概要
- 論文の詳細を見る
- 2003-06-05
著者
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WOO Sang-Gyun
Process Development Team. Samsung Electronic Co., Ltd.
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Kim J‐b
Korean Advanced Inst. Sci. And Technol. (kaist) Daejeon Kor
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Kim Jin-baek
Department Of Chemistry And School Of Molecular Science (bk21) Korea Advanced Institute Of Science A
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Kim Jin-baek
Department Of Chemistry School Of Molecular Science (bk-21) And Center For Advanced Functional Polym
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JANG Ji-Hyun
Department of Chemistry, School of Molecular Science (BK-21), and Center for Advanced Functional Pol
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KIM Hyun-Woo
Process Development Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd.
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Woo S‐g
Samsung Electronic Co. Ltd. Kyunggi‐do Kor
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Jang Ji-hyun
Department Of Chemistry School Of Molecular Science (bk-21) And Center For Advanced Functional Polym
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Kim Jin-baek
Department Of Advanced Materials Engineering Korea Advanced Institute Of Science And Technology
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Kim Hyun-woo
Department Of Veterinary Physiology College Of Veterinary Medicine And Bk21 Program For Veterinary S
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Kim Hyun-woo
Process Development Team Semiconductor R&d Center Samsung Electronics Co. Ltd.
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Kim Hyun-woo
Process Development Team Semiconductor R&d Center Samsung Electronics
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Woo Sang-gyun
Process Development Team. Samsung Electronic Co. Ltd.
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Woo Sang-Gyun
Process Development Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd.
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