193-nm Photoresists Based on Norbornene Copolymers with Derivatives of Bile Acid
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概要
- 論文の詳細を見る
- 2000-04-05
著者
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Kim J‐b
Korean Advanced Inst. Sci. And Technol. (kaist) Daejeon Kor
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Kim Jin-baek
Department Of Chemistry And School Of Molecular Science (bk21) Korea Advanced Institute Of Science A
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Kim Jin-baek
Department Of Chemistry School Of Molecular Science (bk-21) And Center For Advanced Functional Polym
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Kwon Y‐g
Department Of Chemistry School Of Molecular Science (bk21). Korea Advanced Institute Of Science And
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YUN Hyo-Jin
Department of Chemistry, School of Molecular Science (BK21). Korea Advanced Institute of Science and
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KWON Young-Gil
Department of Chemistry, School of Molecular Science (BK21). Korea Advanced Institute of Science and
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LEE Wook
Department of Chemistry, Korea Advanced Institute of Science and Technology
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Kim Jin-baek
Department Of Advanced Materials Engineering Korea Advanced Institute Of Science And Technology
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Yun Hyo-jin
Department Of Chemistry School Of Molecular Science (bk21). Korea Advanced Institute Of Science And
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Kwon Young-gil
Department Of Chemistry Korea Advanced Institute Of Science And Technology
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Lee Wook
Department Of Chemistry Korea Advanced Institute Of Science And Technology
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LEE Wook
Department of Biology, Chungnam National University
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