Poly(isobornyl methacrylate-co-3-(t-butoxycarbonyl)-1-vinyl-2-caprolactam) for an Environmentally Stable Chemically Amplified Resist
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概要
- 論文の詳細を見る
- Society of Polymer Scienceの論文
- 1999-09-15
著者
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Kim Jin-baek
Department Of Chemistry And School Of Molecular Science (bk21) Korea Advanced Institute Of Science A
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KWON Young-Gil
Department of Chemistry, School of Molecular Science (BK21). Korea Advanced Institute of Science and
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Kim Jin-baek
Department Of Advanced Materials Engineering Korea Advanced Institute Of Science And Technology
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Jung Min-ho
Department Of Advanced Materials Engineering Korea Advanced Institute Of Science And Technology
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Choi Jae-hak
Department Of Chemistry School Of Molecular Science (bk21) And Center For Advanced Functional Polyme
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Choi Jae-hak
Department Of Advanced Materials Engineering Korea Advanced Institute Of Science And Technology
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Kwon Young-gil
Department Of Chemistry Korea Advanced Institute Of Science And Technology
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KIM Hyunwoo
Department of Advanced Materials Engineering, Korea Advanced Institute of Science and Technology
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Kim Hyunwoo
Department Of Advanced Materials Engineering Korea Advanced Institute Of Science And Technology
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Kim Jin-Beak
Department of Advanced Materials Engineering, Korea Advanced Institute of Science and Technology
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- Novel Molecular Resist Based on Derivative of Cholic Acid
- 193-nm Photoresists Based on Norbornene Copolymers with Derivatives of Bile Acid
- Room Temperature Processable Organic-Inorganic Hybrid Photolithographic Materials Based on a Methoxysilane Cross-Linker
- A Novel Patterning Method of Low-resistivity Metals
- Poly(isobornyl methacrylate-co-3-(t-butoxycarbonyl)-1-vinyl-2-caprolactam) for an Environmentally Stable Chemically Amplified Resist
- Adhesion Enhancement of Norbornene Polymers with Lithocholate Substituents for 193-nm Resists
- Preparation and stereochemistry of cobalt(III) complexes containing 1,1,11,11-tetraphenyl-4,8-diaza-1,11-diphosphaundecane or (3S,9S)-3,9-dimethyl-1,1,11,11-tetraphenyl-4,8-diaza-1,11-diphosphaundecane, (C6H5)2CHRNHCH2CH2CH2NHCHRCH2P(C6H5)2 (R=H or CH3).