Kim Jin-baek | Department Of Chemistry And School Of Molecular Science (bk21) Korea Advanced Institute Of Science A
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- Kim Jin-Baekの詳細を見る
- 同名の論文著者
- Department Of Chemistry And School Of Molecular Science (bk21) Korea Advanced Institute Of Science Aの論文著者
関連著者
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Kim Jin-baek
Department Of Chemistry And School Of Molecular Science (bk21) Korea Advanced Institute Of Science A
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Kim Jin-baek
Department Of Advanced Materials Engineering Korea Advanced Institute Of Science And Technology
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Kim J‐b
Korean Advanced Inst. Sci. And Technol. (kaist) Daejeon Kor
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Kim Jin-baek
Department Of Chemistry School Of Molecular Science (bk-21) And Center For Advanced Functional Polym
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KWON Young-Gil
Department of Chemistry, School of Molecular Science (BK21). Korea Advanced Institute of Science and
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Kwon Young-gil
Department Of Chemistry Korea Advanced Institute Of Science And Technology
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Park Ji
Department of Herbology, College of Oriental Medicine, Daegu Haany University
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Kwon Y‐g
Department Of Chemistry School Of Molecular Science (bk21). Korea Advanced Institute Of Science And
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JANG Ji-Hyun
Department of Chemistry, School of Molecular Science (BK-21), and Center for Advanced Functional Pol
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Jang Ji-hyun
Department Of Chemistry School Of Molecular Science (bk-21) And Center For Advanced Functional Polym
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YUN Hyo-Jin
Department of Chemistry, School of Molecular Science (BK21). Korea Advanced Institute of Science and
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Yun Hyo-jin
Department Of Chemistry School Of Molecular Science (bk21). Korea Advanced Institute Of Science And
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Park Ji
Department Of Biotechnology Pukyong National University
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Choi Jae-hak
Department Of Chemistry School Of Molecular Science (bk21) And Center For Advanced Functional Polyme
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Choi Jae-hak
Department Of Advanced Materials Engineering Korea Advanced Institute Of Science And Technology
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PARK Ji
Department of Biomedical Engineering, College of Biomedical Science & Engineering, Inje University
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WOO Sang-Gyun
Process Development Team. Samsung Electronic Co., Ltd.
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KIM Hyun-Woo
Process Development Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd.
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Kim Jin-baek
Department Of Chemistry Korea Advanced Institute Of Science And Technology
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KWON Younggil
Department of Chemistry, Korea Advanced Institute of Science and Technology
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YUN Hyojin
Department of Chemistry, Korea Advanced Institute of Science and Technology
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GANESAN Ramakrishnan
Department of Chemistry, Korea Advanced Institute of Science and Technology
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CHOI Jae-Hak
Radiation Application Research Division, Korea Atomic Energy Research Institute
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Ganesan Ramakrishnan
Department Of Chemistry Korea Advanced Institute Of Science And Technology
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Park Ji
Department Of Chemistry And School Of Molecular Science (bk21) Korea Advanced Institute Of Science A
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Woo S‐g
Samsung Electronic Co. Ltd. Kyunggi‐do Kor
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LEE Wook
Department of Chemistry, Korea Advanced Institute of Science and Technology
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Song Ki-yong
Electronic Material Lab. Samsung Advanced Institute Of Technology
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Kim Jin-baek
Department Of Chemistry School Of Molecular Science (bk21) And Center For Advanced Functional Polyme
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Son Hae-jung
Electronic Material Lab. Samsung Advanced Institute Of Technology
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Noh Chang-ho
Electronic Material Lab. Samsung Advanced Institute Of Technology
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Yun Hyojin
Department Of Chemistry Korea Advanced Institute Of Science And Technology
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Jung Min-ho
Department Of Advanced Materials Engineering Korea Advanced Institute Of Science And Technology
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Jang Ji-hyun
Department Of Chemistry School Of Molecular Science (bk21) And Center For Advanced Functional Polyme
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Choi Jae-hak
Radiation Application Research Division Korea Atomic Energy Research Institute
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Kim Hyun-woo
Department Of Veterinary Physiology College Of Veterinary Medicine And Bk21 Program For Veterinary S
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Kim Hyun-woo
Process Development Team Semiconductor R&d Center Samsung Electronics Co. Ltd.
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Kim Hyun-woo
Process Development Team Semiconductor R&d Center Samsung Electronics
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Kwon Younggil
Department Of Chemistry Korea Advanced Institute Of Science And Technology
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KIM Jin-Young
Electronic Material Lab., Samsung Advanced Institute of Technology
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HWANG Ok-Chae
Electronic Material Lab., Samsung Advanced Institute of Technology
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BYK T.
Electronic Material Lab., Samsung Advanced Institute of Technology
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SOKOLOV V.
Research Institute for Physical and Chemical Problems, Belarussian State University
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KIM Hyunwoo
Department of Advanced Materials Engineering, Korea Advanced Institute of Science and Technology
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KO Jong-Sung
Department of Advanced Materials Engineering, Korea Advanced Institute of Science and Technology
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LEE Bum-Wook
Samsung SDI Co. Ltd.
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Kim Hyunwoo
Department Of Advanced Materials Engineering Korea Advanced Institute Of Science And Technology
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Ko Jong-sung
Department Of Advanced Materials Engineering Korea Advanced Institute Of Science And Technology
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Hwang Ok-chae
Electronic Material Lab. Samsung Advanced Institute Of Technology
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Woo Sang-gyun
Process Development Team. Samsung Electronic Co. Ltd.
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Kim Jin-baek
Department Of Chemistry And School Of Molecular Science (bk21) Korea Advanced Institute Of Science A
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Park Ji
Department Of Chemistry And School Of Molecular Science (bk21) Korea Advanced Institute Of Science A
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Byk T.
Electronic Material Lab. Samsung Advanced Institute Of Technology
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Kim Jin-young
Electronic Material Lab. Samsung Advanced Institute Of Technology
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Sokolov V.
Research Institute For Physical And Chemical Problems Belarussian State University
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Lee Wook
Department Of Chemistry Korea Advanced Institute Of Science And Technology
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Woo Sang-Gyun
Process Development Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd.
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Kim Jin-Beak
Department of Advanced Materials Engineering, Korea Advanced Institute of Science and Technology
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LEE Wook
Department of Biology, Chungnam National University
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PARK Ji
Department of Biochemistry, College of Life Science and Biotechnology, Yonsei University
著作論文
- Cyclopropyl-containing Photoacid Generators for Chemically Amplified Resists
- High Performance Molecular Resists Based on β-Cyclodextrin
- Silicon-containing Bilayer Resist Based on a Single Component Nonchemically Amplified Resist System
- Novel Molecular Resist Based on Derivative of Cholic Acid
- 193-nm Photoresists Based on Norbornene Copolymers with Derivatives of Bile Acid
- Room Temperature Processable Organic-Inorganic Hybrid Photolithographic Materials Based on a Methoxysilane Cross-Linker
- A Novel Patterning Method of Low-resistivity Metals
- Poly(isobornyl methacrylate-co-3-(t-butoxycarbonyl)-1-vinyl-2-caprolactam) for an Environmentally Stable Chemically Amplified Resist
- Adhesion Enhancement of Norbornene Polymers with Lithocholate Substituents for 193-nm Resists