Kwon Young-gil | Department Of Chemistry Korea Advanced Institute Of Science And Technology
スポンサーリンク
概要
関連著者
-
Kim Jin-baek
Department Of Chemistry And School Of Molecular Science (bk21) Korea Advanced Institute Of Science A
-
KWON Young-Gil
Department of Chemistry, School of Molecular Science (BK21). Korea Advanced Institute of Science and
-
Kim Jin-baek
Department Of Advanced Materials Engineering Korea Advanced Institute Of Science And Technology
-
Kwon Young-gil
Department Of Chemistry Korea Advanced Institute Of Science And Technology
-
Kim J‐b
Korean Advanced Inst. Sci. And Technol. (kaist) Daejeon Kor
-
Kim Jin-baek
Department Of Chemistry School Of Molecular Science (bk-21) And Center For Advanced Functional Polym
-
Kwon Y‐g
Department Of Chemistry School Of Molecular Science (bk21). Korea Advanced Institute Of Science And
-
YUN Hyo-Jin
Department of Chemistry, School of Molecular Science (BK21). Korea Advanced Institute of Science and
-
Yun Hyo-jin
Department Of Chemistry School Of Molecular Science (bk21). Korea Advanced Institute Of Science And
-
LEE Wook
Department of Chemistry, Korea Advanced Institute of Science and Technology
-
Jung Min-ho
Department Of Advanced Materials Engineering Korea Advanced Institute Of Science And Technology
-
Choi Jae-hak
Department Of Chemistry School Of Molecular Science (bk21) And Center For Advanced Functional Polyme
-
Choi Jae-hak
Department Of Advanced Materials Engineering Korea Advanced Institute Of Science And Technology
-
KIM Hyunwoo
Department of Advanced Materials Engineering, Korea Advanced Institute of Science and Technology
-
Kim Hyunwoo
Department Of Advanced Materials Engineering Korea Advanced Institute Of Science And Technology
-
Lee Wook
Department Of Chemistry Korea Advanced Institute Of Science And Technology
-
Kim Jin-Beak
Department of Advanced Materials Engineering, Korea Advanced Institute of Science and Technology
-
LEE Wook
Department of Biology, Chungnam National University
著作論文
- Novel Molecular Resist Based on Derivative of Cholic Acid
- 193-nm Photoresists Based on Norbornene Copolymers with Derivatives of Bile Acid
- Poly(isobornyl methacrylate-co-3-(t-butoxycarbonyl)-1-vinyl-2-caprolactam) for an Environmentally Stable Chemically Amplified Resist