Adhesion-promoted Copolymers for l93-nm Photoresists without Cross-linking during Lithographic Process
スポンサーリンク
概要
著者
-
Kim J‐b
Korean Advanced Inst. Sci. And Technol. (kaist) Daejeon Kor
-
Kim Jin-baek
Department Of Chemistry School Of Molecular Science (bk-21) And Center For Advanced Functional Polym
-
Kwon Y‐g
Department Of Chemistry School Of Molecular Science (bk21). Korea Advanced Institute Of Science And
-
Yun Hyo-jin
Department Of Chemistry School Of Molecular Science (bk21). Korea Advanced Institute Of Science And
関連論文
- Cyclopropyl-containing Photoacid Generators for Chemically Amplified Resists
- Photobleaching Photoacid Generator
- Novel Molecular Resist Based on Derivative of Cholic Acid
- Postexposure Delay Effect in Chemically Amplified Resists
- 193-nm Photoresists Based on Norbornene Copolymers with Derivatives of Bile Acid
- Adhesion-promoted Copolymers for l93-nm Photoresists without Cross-linking during Lithographic Process
- Recognition of Continuous Korean Sign Language Using Gesture Tension Model and Soft Computing Technique(Human-computer Interaction)