Simulation of Photoresist Thermal Flow Process with Viscous Flow Model
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-09-15
著者
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KIM Hyun-Woo
Process Development Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd.
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YOON Jin-Young
Process Development Team, Semiconductor R&D Center, Samsung Electronics, Co., Ltd.
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CHUNG Won-Young
CAE Team, Semiconductor R&D Center, Samsung Electronics
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KIM Tai-Kyung
CAE Team, Semiconductor R&D Center, Samsung Electronics
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PARK Young-Kwan
CAE Team, Semiconductor R&D Center, Samsung Electronics
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KONG Jeong-Taek
CAE Team, Semiconductor R&D Center, Samsung Electronics
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Kong Jeong-taek
Cae Team Semiconductor R&d Center Samsung Electronics
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LEE Yero
CAE Team, Semiconductor R&D Center, Samsung Electronics
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- Simulation of Photoresist Thermal Flow Process with Viscous Flow Model
- Simulation of Photoresist Thermal Flow Process with Viscous Flow Model