Nanosize Patterning with Nanoimprint Lithography Using Poly(vinyl alcohol) Transfer Layer
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概要
- 論文の詳細を見る
Coupling the imprint mold structure having a self-assembled monolayer (SAM) and a buffer oxide layer (BOL) with a poly(vinyl alcohol) (PVA) resin is investigated for thermal nanoimprint lithography on flexible substrates. The mold structure is SAM/BOL/Cr. Among the buffer oxides tested (SiO2, Al2O3, HfO2), SiO2 results in the most hydrophobic character at the SAM surface of the mold. Water-soluble PVA resin is shown to be an excellent pattern transfer layer due to its clean release from the hydrophobic mold and strong barrier to SF6 etching during subsequent substrate patterning. The combination of SAM/SiO2/Cr mold structure with PVA resin is demonstrated to produce high quality, defect-free nanopatterns on both rigid silicon and flexible poly(ethylene terephthalate) and polyimide substrates.
- 2011-06-25
著者
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Ahn Jinho
Department Of Materials Engineering Graduate School Of Advanced Materials And Chemical Engineering H
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Park In-Sung
Department of Material Science and Engineering, Hanyang University, 17 Haengdang-dong, Seongdong-gu, Seoul 133-791, Korea
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Park In-Sung
Department of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea
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Nichols William
Department of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea
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Ahn Jinho
Department of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea
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Ahn Jinho
Department of Material Science and Engineering, Hanyang University, 17 Haengdang-dong, Seongdong-gu, Seoul 133-791, Korea
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AHN Jinho
Department of Computer Science, Kyonggi University
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